Structural sensitivity of the spin Hall magnetoresistance in antiferromagnetic thin films


Journal article


Andrew Ross, Romain Lebrun, Camilo Ulloa, Daniel A. Grave, Asaf Kay, Lorenzo Baldrati, Florian Kronast, Sergio Valencia, Avner Rothschild, Mathias Kläui, Mathias Kläui
Physical Review B, vol. 102(9), 2020 Aug 10

Cite

Cite

APA
Ross, A., Lebrun, R., Ulloa, C., Grave, D. A., Kay, A., Baldrati, L., … Kläui, M. (2020). Structural sensitivity of the spin Hall magnetoresistance in antiferromagnetic thin films. Physical Review B, 102(9).

Chicago/Turabian
Ross, Andrew, Romain Lebrun, Camilo Ulloa, Daniel A. Grave, Asaf Kay, Lorenzo Baldrati, Florian Kronast, et al. “Structural Sensitivity of the Spin Hall Magnetoresistance in Antiferromagnetic Thin Films.” Physical Review B 102, no. 9 (August 10, 2020).

MLA
Ross, Andrew, et al. “Structural Sensitivity of the Spin Hall Magnetoresistance in Antiferromagnetic Thin Films.” Physical Review B, vol. 102, no. 9, Aug. 2020.


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