Structural sensitivity of the spin Hall magnetoresistance in antiferromagnetic thin films


Journal article


Andrew Ross, Romain Lebrun, Camilo Ulloa, Daniel A. Grave, Asaf Kay, Lorenzo Baldrati, Florian Kronast, Sergio Valencia, Avner Rothschild, Mathias Kläui, Mathias Kläui
Physical Review B, vol. 102(9), 2020 Aug 10

Cite

Cite

APA   Click to copy
Ross, A., Lebrun, R., Ulloa, C., Grave, D. A., Kay, A., Baldrati, L., … Kläui, M. (2020). Structural sensitivity of the spin Hall magnetoresistance in antiferromagnetic thin films. Physical Review B, 102(9).


Chicago/Turabian   Click to copy
Ross, Andrew, Romain Lebrun, Camilo Ulloa, Daniel A. Grave, Asaf Kay, Lorenzo Baldrati, Florian Kronast, et al. “Structural Sensitivity of the Spin Hall Magnetoresistance in Antiferromagnetic Thin Films.” Physical Review B 102, no. 9 (August 10, 2020).


MLA   Click to copy
Ross, Andrew, et al. “Structural Sensitivity of the Spin Hall Magnetoresistance in Antiferromagnetic Thin Films.” Physical Review B, vol. 102, no. 9, Aug. 2020.


BibTeX   Click to copy

@article{andrew2020a,
  title = {Structural sensitivity of the spin Hall magnetoresistance in antiferromagnetic thin films},
  year = {2020},
  month = aug,
  day = {10},
  issue = {9},
  journal = {Physical Review B},
  volume = {102},
  author = {Ross, Andrew and Lebrun, Romain and Ulloa, Camilo and Grave, Daniel A. and Kay, Asaf and Baldrati, Lorenzo and Kronast, Florian and Valencia, Sergio and Rothschild, Avner and Kläui, Mathias and Kläui, Mathias},
  month_numeric = {8}
}


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