Process–structure–property relations of micron thick Gd2O3 films deposited by reactive electron-beam physical vapor deposition (EB-PVD)


Journal article


Daniel A. Grave, Zachary R. Hughes, Joshua A. Robinson, Thomas P. Medill, Matthew J. Hollander, Anna L. Stump, Michael Labella, Xiaojun Weng, Douglas E. Wolfe
Surface & Coatings Technology, vol. 206(13), 2012 Jan 25, pp. 3094-3103

Cite

Cite

APA
Grave, D. A., Hughes, Z. R., Robinson, J. A., Medill, T. P., Hollander, M. J., Stump, A. L., … Wolfe, D. E. (2012). Process–structure–property relations of micron thick Gd2O3 films deposited by reactive electron-beam physical vapor deposition (EB-PVD). Surface & Coatings Technology, 206(13), 3094–3103.

Chicago/Turabian
Grave, Daniel A., Zachary R. Hughes, Joshua A. Robinson, Thomas P. Medill, Matthew J. Hollander, Anna L. Stump, Michael Labella, Xiaojun Weng, and Douglas E. Wolfe. “Process–Structure–Property Relations of Micron Thick Gd2O3 Films Deposited by Reactive Electron-Beam Physical Vapor Deposition (EB-PVD).” Surface & Coatings Technology 206, no. 13 (January 25, 2012): 3094–3103.

MLA
Grave, Daniel A., et al. “Process–Structure–Property Relations of Micron Thick Gd2O3 Films Deposited by Reactive Electron-Beam Physical Vapor Deposition (EB-PVD).” Surface & Coatings Technology, vol. 206, no. 13, Jan. 2012, pp. 3094–103.


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